Humidity control in the production of semiconductors is used to prevent the build-up of static electricity, prevent dimensional changes from occuring on the surface of the silicon wafer and cool the manufacturing environment.

Any uncontrolled electrical static discharge that occurs during production can damage the surface of the semiconductors and significantly lower production yields. The manufacturing process generates heat and this in-turn dries the air. As dry air promotes static build-up, humidifiers are used to control the atmosphere to around 55% relative humidity (%rH). This encourages the static to naturally dissipate removing the risk of damage to the surface of the semiconductor.

However, the printed surfaces of the silicon wafer are also very sensitive to moisture. The conductive tracts on the surface can distort during manufacturing if exposed to incorrect humidity levels. Extremely close control of humidity to ±0.1°C dew point over any 40 minute period is required. Any variation greater than this and the conductive tracts will be damaged and the semiconductor ruined.

Steam humidifiers such as the Neptronic SKE can provide this precise control when used in conjunction with a PureFlo RO water filter.

Although steam provides extremely close control, specialist cold water spray humidifiers can be used, like the JetSpray, as the evaporation of the spray creates an adiabatic cooling effect. This helps lower temperatures during manufacturing and reduces the required cooling.

JS Humidifiers offers a bespoke JetSpray humidifier for semiconductor applications that incorporates a fractional control valve providing the precise and consistent control required for this application. This not only provides cooling but also has much lower running costs than steam as it uses cold water.

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